Electrochemical etch-stop technique for silicon membranes with p- and n-type regions and its application to neural sieve electrodes
In this study the field effects on electrochemic ally controlled silicon etching in KOH during three- and four-electrode pn etch-stop have been investigated. When a p-doped bulk area is surrounded by n-doped silicon and the n-doped silicon is electrochemic ally passivated, small lines of bulk silicon in between the n-doped silicon would not etch. The size of the bulk silicon that did not etch coul