Surface chemistry of HfI4 on Si(100)-(2 x 1) studied by core level photoelectron spectroscopy
The chemistry Of HfI4 adsorbed on the Si(100)-(2x1) surface has been studied by core level photoelectron spectroscopy in ultra-high vacuum. Two stable surface intermediates are identified: HfI3 and HfI2, both of which remain upon heating to 690 K. The dissociation of HfI4 is accompanied by the formation of SiI. In addition, HfI4 is Observed up to 300 K. Complete desorption of iodine occurs in the