Growth and oxidation of ultra-thin Pt-Sn layers on Pt(111) by molecular and atomic oxygen
The preparation of ultra-thin PtSn-alloyed layers by molecular beam epitaxy was studied using low-energy electron microscopy (LEEM) and micro-diffraction (μ-LEED). Deposition at a sample temperature of 435 °C initially results in the formation of a Pt3Sn/Pt(111) layer showing a (2 × 2) reconstruction. With continued Sn deposition, a Pt2Sn/Pt(111) layer develops, showing a (3×3)R30° reconstruction.
