Concentration-dependent formation mechanisms in mesophase silica-surfactant films
The development of surfactant-templated mesoporous films grown at the air/water interface was investigated using specular and off-specular X-ray reflectivity techniques. The samples were prepared in acidic conditions using cetyltrimethylammonium bromide (CTABr, 0.075 M) and different concentrations (0.27-0.88 M) of tetramethyloxysilane (TMOS). At CTABr/TMOS molar ratio between 0.277 and 0.093, the
