Synthesis and Cationic Photopolymerization of New Silicon-Containing Oxetane Monomers
The cationic photopolymerization of oxetane-based systems containing silicon monomers was investigated. For this purpose, three new silicon-containing oxetane monomers were synthesized through a simple and straightforward synthetic method. The silicon-containing monomers were added to a typical oxetane resin, 3,3-[oxydi(methylene)]bis(3-ethyloxetane), in concentrations of 1-5 wt %. They exploited