Process development and characterization of antisticking layers on nickel-based stamps designed for nanoimprint lithography
Thin films of different derivatives of fluorinated alkyl phosphoric acids have been deposited from aqueous solutions onto surfaces of oxidized polycrystalline nickel stamps. which are commonly used in several industrial applications of nanoimprint lithography (NIL). The films have been established in order to increase the antiadhesion tendencies at the stamp polymer interface. Thicknesses, chemica
