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For the Inner Tracking System 3 (ITS3) upgrade, the ALICE experiment at CERN requires monolithic active pixel sensors of dimensions up to 97 mm×266 mm, occupying a large fraction of a 300 mm wafer. To manufacture such a wafer-scale device, larger than the single design reticle size, stitching is employed. The MOnolithic Stitched Sensor (MOSS) is a prototype silicon pixel sensor of 14 mm×259 mm siz
