Pulsed laser deposited transparent and conductive V-doped ZnO thin films
ZnO and vanadium-doped ZnO (0.7–4.1 at.%) thin films were deposited onto corning glass substrates by the pulsed laser deposition technique using a KrF excimer laser (λ = 248 nm). The films were deposited at 500 °C under an oxygen pressure of 1 Pa with a laser fluence of 2 J/cm2. The structural, morphological, optical and electrical properties as a function of the dopant atomic concentration were i