A new laser-plasma X-ray source for microscopy and lithography
A new high-brightness source for soft X-rays and EUV-radiation has been developed. This laser-plasma source utilizes a microscopic liquid droplet or jet as target. The result is a reduction of debris emission by several orders of magnitude compared to conventional laser plasmas. The minute amounts of residual ionic/atomic debris can be obstructed by filters or a localized gas shield. Target liquid